Novel combination of photoactive species:photoresists formed from selectively esterified novolacs and polyfunctional photoactive compounds

Author(s):

• III,A.T.Jeffries ( Olin Microelectronic Materials )
• Brzozowy,D.J.
• Naiini,A.A.
• Gallagher-Wetmore,P.M.

Publication title:

Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3049

Pub. Year:

1997

Page(from):

746

Page(to):

756

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819424631 [0819424633]

Language:

English

Call no.:

P63600/3049

Type:

Conference Proceedings