Blank Cover Image

Environmentally stable chemically amplified positive resist containing vinyllactam terpolymers

Author(s):
Bok,C.-K. ( Hyundai Electronics Industries Co.,Ltd. )
Koh,C.-W.
Jung,M.-H.
Baik,K.-H.
Kim,J.-B.
Cheong,J.-H.
1 more
Publication title:
Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3049
Pub. Year:
1997
Page(from):
501
Page(to):
511
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424631 [0819424633]
Language:
English
Call no.:
P63600/3049
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings "Novel chemically amplified positive resist containing acetal-type crosslinker of poly(3,3'-dimethoxypropene) for 193-nm top surface imaging process"

Koh,C.-W., Jung,J.-C., Kim,M.-S., Kong,K.-K., Lee,G., Jung,M.-H., Kim,J.-S., Shin,K.-S.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Design of cycloolefin-maleic-anhydride resist for ArF lithography

Jung,J.-C., Bok,C.-K., Baik,K.-H.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Novel 193-nm single-layer resist containing a multifunctional monomer

Lee, G., Koh, C. -W., Jung, J. -C., Jung, M. -H., Kim, H. -S., Baik, K. -H., Choi, I. -H.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Comparative evaluation of positive and negative chemically amplified resist characteristics for 90-nm-node photomask production

Jeong, W.-G., Park, D.-I., Park, E.-S., Seo, S.-K., Kwon, H.-J., Kim, J.-M., Jung, S.-M., Choi, S.-S.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Reduction of substrate dependency of chemically amplified resist

Chun,J.-S., Bok,C.-K., Baik,K.-H.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Chemically amplified resists based on the norbornene copolymers with steroid derivatives

Kim, J. -B., Lee, B. -W., Kang, J. -S., Kim, S. -J., Park, J. -H., Seo, D. -C., Balk, K. -H., Jung, J. -C., Roh, C. -H.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Terpolymer of maleic anhydride and cycloolefin derivatives as an ArF photoresist

Kim,S.-J., Park,J.-H., Kim,J.-H., Kim,K.-D., Lee,H., Jung,J.-C., Bok,C.-K., Baik,K.-H.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Elimination of bottom-pinching effect in environmentally stable chemically amplified resists

Soo,C.P., Fan,M.H., Bourdillon,A.J., Chan,L.H.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings ArF photoresist containing novel acid labile cross-linker for high contrast and PED stability

Lee,G., Koh,C.-W., Hong,S.-E., Jung,J.-C., Jung,M.-H., Kim,H.-S., Baik,K.-H.

SPIE - The International Society for Optical Engineering
11 Conference Proceedings Acid diffusion and evaporation in chemically amplified resists

Kim, J. -B., Kwon, Y. -G., Choi, J. -H., Jung, M. -H.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Environmentally stable chemically amplified resist

Kameyama,Y., Tomiyasu,H., Tsukamoto,M., Niinomi,T., Tanaka,Y., Fujita,J., Ochiai,T., Uedono,A., Tanigawa,S.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Silicon-Containing Resist Materials Based on Chemical Amplification

Grampel, J. C. van de, Puyenbroek, R., Rousseeuw, B. A. C., Drift, E. W. J. M. van der

American Chemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12