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Reactivity and kinetic parameters for UVIIHS

Author(s):
Wallraff,G.M. ( IBM Almaden Research Ctr. )
Opitz,J.
Hinsberg,W.D.
Houle,F.A.
Thackeray,J.W.
Fedynyshyn,T.H.
Kang,D.
Rajaratnam,M.M.
3 more
Publication title:
Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3049
Pub. Year:
1997
Page(from):
492
Page(to):
500
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424631 [0819424633]
Language:
English
Call no.:
P63600/3049
Type:
Conference Proceedings

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