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Terpolymer of maleic anhydride and cycloolefin derivatives as an ArF photoresist

Author(s):
Kim,S.-J. ( Korea Kumho Petrochemical Co.,Ltd. )
Park,J.-H.
Kim,J.-H.
Kim,K.-D.
Lee,H.
Jung,J.-C.
Bok,C.-K.
Baik,K.-H.
3 more
Publication title:
Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3049
Pub. Year:
1997
Page(from):
430
Page(to):
436
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424631 [0819424633]
Language:
English
Call no.:
P63600/3049
Type:
Conference Proceedings

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