New single-layer positive photoresists for 193-nm photolithography
- Author(s):
Okoroanyanwu,U. ( Univ.of Texas at Austin ) Shimokawa,T. Byers,J.D. Medeiros,D.R. Willson,C.G. Niu,Q.J. Frechet,J.M.J. Allen,R.D. - Publication title:
- Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3049
- Pub. Year:
- 1997
- Page(from):
- 92
- Page(to):
- 103
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819424631 [0819424633]
- Language:
- English
- Call no.:
- P63600/3049
- Type:
- Conference Proceedings
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