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Acid amplification of chemically amplified resists for 193-nm lithography

Author(s):
Ohfuji,T. ( Association of Super-Advanced Electronics Technologies )
Takahashi,M.
Kuhara,K.
Ogawa,T.
Ohtsuka,H.
Sasago,M.
Ichimura,K.
2 more
Publication title:
Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3049
Pub. Year:
1997
Page(from):
76
Page(to):
82
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424631 [0819424633]
Language:
English
Call no.:
P63600/3049
Type:
Conference Proceedings

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