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Practical resists for 193-nm lithography using 2.38% TMAH:physicochemical influences on resist performance

Author(s):
Szmanda,C.R. ( Shipley Co. )
Yu,J.
Barclay,G.G.
Cameron,J.F.
Kavanagh,R.J.
Blacksmith,R.F.
III,P.Trefonas
Taylor,G.N.
3 more
Publication title:
Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3049
Pub. Year:
1997
Page(from):
65
Page(to):
75
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424631 [0819424633]
Language:
English
Call no.:
P63600/3049
Type:
Conference Proceedings

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