Fabrication of 0.15 ｦﾌm SOIp-MOSFETs using Synchrotron Radiation X-ray Lithography,

Fabrication of 0.15 ｦﾌm SOIp-MOSFETs using Synchrotron Radiation X-ray Lithography,

Author(s):

Choi,S.S.

Publication title:

Optics for science and new technology : 17th Congress of the International Commission for Optics, August 19-23, 1996, Hotel Riviera(Yusong), Taejon Korea

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2778

Pub. date:

1996

Vol.:

Part1

Page(from):

15

Page(to):

16

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819421647 [0819421642]

Language:

English

Call no.:

P63600/2778

Type:

Conference Proceedings

Details

TDL ID:	ZA00020268
Series ID:	PA00000029
Conf. info. (Name):	Congress of the International Commission for Optics
Conf. info. (Number):	1996 : 17th
Conf. info. (Venue):	Taejon, Korea
Conf. info. (Date):	1996.09.19-1996.08.23

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