Focus and exposure dose determination using stepper alignment
- Author(s):
- Dirksen,P. ( Philips Research Labs. )
- Pellens,R.
- Juffermans,C.A.
- Reuhman-Huisken,M.E.
- Laan,H.van der
- Publication title:
- Optical Microlithography IX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2726
- Pub. Year:
- 1996
- Vol.:
- Part2
- Page(from):
- 799
- Page(to):
- 808
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421029 [0819421022]
- Language:
- English
- Call no.:
- P63600/2726
- Type:
- Conference Proceedings
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