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Application of alternating phase-shifting masks to sub-quarter-micrometer contact holes

Author(s):
Lim,S.-C. ( Samsung Electronics Co.,Ltd. )
Kye,J.-W.
Woo,S.-G.
Kim,S.-G.
Kang,H.-Y.
Han,W.-S.
Koh,Y.-B.
2 more
Publication title:
Optical Microlithography IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2726
Pub. date:
1996
Vol.:
Part2
Page(from):
516
Page(to):
523
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819421029 [0819421022]
Language:
English
Call no.:
P63600/2726
Type:
Conference Proceedings

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