DUV resist profile improvement on TiN-deposited metal layer

Author(s):

• Lin,C.-H. ( Taiwan Semiconductor Manufacturing Co. )
• Chen,C.-C.
• Jenq,J.-S.
• Beeck,M.Op de
• hove,L.Van den

Publication title:

Optical Microlithography IX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2726

Pub. Year:

1996

Vol.:

Part1

Page(from):

427

Page(to):

436

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819421029 [0819421022]

Language:

English

Call no.:

P63600/2726

Type:

Conference Proceedings