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Top-surface imaging and optical proximity correction:a way to 0.18-ヲフm lithography at 248 nm

Author(s):
Goethals,A.M. ( IMEC )
Vertommen,J.
Roey,F.Van
Yen,A.
Tritchkov,A.
Ronse,K.
Jonckheere,R.
hove,L.Van den
3 more
Publication title:
Optical Microlithography IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2726
Pub. date:
1996
Vol.:
Part1
Page(from):
362
Page(to):
374
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819421029 [0819421022]
Language:
English
Call no.:
P63600/2726
Type:
Conference Proceedings

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