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Method of easily extracting resist development parameters for lithography simulation

Author(s):
Lucas,K.D. ( Motorola )
Ivin,V.V.
Kudrja,V.P.
Larin,D.Yu.
Makhviladze,T.M.
Medvedeva,M.G.
Rogov,A.A.
Verzunov,S.V.
Yang,D.C.
4 more
Publication title:
Optical Microlithography IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2726
Pub. Year:
1996
Vol.:
Part1
Page(from):
348
Page(to):
359
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819421029 [0819421022]
Language:
English
Call no.:
P63600/2726
Type:
Conference Proceedings

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