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Viability of conventional high-NA KrF imaging for sub-0.25-ヲフm lithography

Author(s):
Farrell,T.R. ( IBM Corp. )
Nunes,R.
Campbell,R.
Hoh,P.
Samuels,D.J.
Kirk,J.P.
Conley,W.E.
Iba,J.
Shibata,T.
4 more
Publication title:
Optical Microlithography IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2726
Pub. Year:
1996
Vol.:
Part1
Page(from):
46
Page(to):
53
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819421029 [0819421022]
Language:
English
Call no.:
P63600/2726
Type:
Conference Proceedings

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