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Characterization of pattern density and the metal stack composition on chlorine residues from the metal etch process

Author(s):
  • Loong,S.Y. ( National Univ.of Singapore and Chartered Semiconductor Manufacturing Ltd. (Singapore) )
  • Lee,H.K. ( National Univ.of Singapore )
  • Zhou,M.S. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
  • Chan,L.H. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
  • Premachandran,V. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
Publication title:
Multilevel Interconnect Technology II
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3508
Pub. Year:
1998
Page(from):
170
Page(to):
180
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819429674 [0819429678]
Language:
English
Call no.:
P63600/3508
Type:
Conference Proceedings

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