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High-power source and illumination system for extreme ultraviolet lithography

Author(s):
Kubiak,G.D. ( Sandia National Labs. )
Bernardez,L.J.
Krenz,K D.
Replogle,W.C.
Sweatt,W.C.
Sweeney,D.W.
Hudyma,R.M.
Shields,H.
3 more
Publication title:
EUV, x-ray, and neutron optics and sources : 21-23 July 1999, Denver, Colorado
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3767
Pub. Year:
1999
Page(from):
136
Page(to):
142
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819432537 [0819432539]
Language:
English
Call no.:
P63600/3767
Type:
Conference Proceedings

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