New approach to optical proximity correction
- Author(s):
Rosenbusch,A. ( Sigma-C GmbH ) Juffermans,A.H. Kirsch,H. Lalanne,F.P. Maurer,W. Romeo,C. Ronse,K. Schiavone,P. Simecek,M. Toublan,O. Watson,J.C. Ziegler,W. Zimmermann,R. - Publication title:
- 18th Annual BACUS Symposium on Photomask Technology and Management
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3546
- Pub. Year:
- 1998
- Page(from):
- 585
- Page(to):
- 593
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819430076 [0819430072]
- Language:
- English
- Call no.:
- P63600/3546
- Type:
- Conference Proceedings
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Integration of alternating phase-shift mask technology into optical proximity correction
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