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TiSi-nitride attenuating phase-shift photomask for 193-nm lithography

Author(s):
Reynolds,G.A.M. ( DuPont Central Research & Development )
French,R.H.
Carcia,P.F.
Torardi,C.C.
Hughes,G.P.
Jones,D.J.
Lemon,M.F.
Reilly,M.
Wilson,L.
Miao,C.R.
5 more
Publication title:
18th Annual BACUS Symposium on Photomask Technology and Management
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3546
Pub. Year:
1998
Page(from):
514
Page(to):
523
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819430076 [0819430072]
Language:
English
Call no.:
P63600/3546
Type:
Conference Proceedings

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