Inspection of OPC reticle for 0.18-ヲフtm-rule devices
- Author(s):
- Ando,A. ( NEC Corp. )
- Tono-oka,Y.
- Shigemura,H.
- Iwasaki,H.
- Tanabe,H.
- Publication title:
- 18th Annual BACUS Symposium on Photomask Technology and Management
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3546
- Pub. Year:
- 1998
- Page(from):
- 270
- Page(to):
- 277
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819430076 [0819430072]
- Language:
- English
- Call no.:
- P63600/3546
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Defect printability for sub-0.18ヲフm design rules using 193-nm lithography process and binary OPC reticle
SPIE - The International Society for Optical Engineering |
8
Conference Proceedings
Optical proximity correction of alternating phase-shift masks for 0.18-ヲフm KrF lithography
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
4
Conference Proceedings
Design,reticle,and wafer OPC manufacturability for the 0.18-ヲフm lithography generation
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
11
Conference Proceedings
High-transmittance rim-type attenuated phase-shift masks for sub-0.2-ヲフm hole patterns
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Line-width uniformity verification for 0.18-ヲフm and below design rule reticles
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
Variable-threshold optical proximity correction(OPC)models for high-performance 0.18-ヲフm process
SPIE - The International Society for Optical Engineering |