Stencil mask technology for ion beam lithography
- Author(s):
Ehrmann,A. ( Siemens AG ) Huber,S. Kasmaier,R. Oelmann,A.B. Struck,T. Springer,R. Butschke,J. Letzkus,F. Kragler,K. Loschner,H. Rangelow,I.W. - Publication title:
- 18th Annual BACUS Symposium on Photomask Technology and Management
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3546
- Pub. Year:
- 1998
- Page(from):
- 194
- Page(to):
- 205
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819430076 [0819430072]
- Language:
- English
- Call no.:
- P63600/3546
- Type:
- Conference Proceedings
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