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Masks for extreme ultraviolet lithography

Author(s):
Vernon,S.P. ( Lawrence Livermore National Lab. )
Kearney,P.A.
Tong,W.M.
Prisbrey,S.
Larson,C.
Moore,C.E.
Weber,F.J.
Cardinale,G.F.
Yan,P.
Hector,S.D.
5 more
Publication title:
18th Annual BACUS Symposium on Photomask Technology and Management
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3546
Pub. Year:
1998
Page(from):
184
Page(to):
193
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819430076 [0819430072]
Language:
English
Call no.:
P63600/3546
Type:
Conference Proceedings

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