Blank Cover Image

Size matters:defect detectability in reticle and wafer inspection including advanced aerial image simulation for defect printability

Author(s):
Almog,E. ( Applied Materials )
Caldwell,R.F.
Chang,F.-C.
Chen,J.F.
Farrar,N.R.
Karklin,L.
Laidig,T.L.
Sabouri,S.
Shen,W.P.
Staud,W.
Wu,C.
Zelenko,J.
7 more
Publication title:
18th Annual BACUS Symposium on Photomask Technology and Management
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3546
Pub. Year:
1998
Page(from):
139
Page(to):
144
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819430076 [0819430072]
Language:
English
Call no.:
P63600/3546
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Aerial image analysis based on UV reticle inspection

Staud, W., Eran, Y., Gottlib, G., Chereshnya, A.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Subhalf-micron mask defect detectability and printability at 1｡ﾟ reticle magnification

Schurz,D.L., Flack,W.W., Newman,G.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Manufacturing an advanced process characterization reticle incorporating halftone biasing

Nakagawa,K.H., Broeke,D.Van Den, Chen,J.F., Laidig,T.L., Wampler,K.E., Caldwell,R.F.

SPIE - The International Society for Optical Engineering
8 Conference Proceedings Reticle OPC defect printability and detectability for 180-nm technology

Rudzinski, M. W., Zurbrick, L. S., Pettibone, D. W., Ananth, M.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Use of KLA-Tencor STARlight SL 300 for in-process contamination inspection to control reticle defect densities

Dutton,D., Shen,W.P., Yee,R., Reynolds,J.A.

SPIE - The International Society for Optical Engineering
9 Conference Proceedings Printability of backside reticle defects

Volk,W., Wiley,J.N., Reynolds,J.A.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Use of KLA-Tencor STARlight SL 300 for in-process contamination inspection to control reticle defect densities

Dutton,D., Shen,W.P., Yee,R., Reynolds,J.A.

SPIE - The International Society for Optical Engineering
10 Conference Proceedings Wafer plane inspection for advanced reticle defects

R. Nagpal, F. Ghadiali, J. Kim, T. Huang, S. Pang

Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Wafer printability simulation accuracy based on UV optical inspection images of reticle defects

Donald W. Pettibone, Mohan Ananth, Maciej W. Rudzinski, Sterling G. Watson, Larry S. Zurbrick

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Reticle defect printability for sub-0.3k1 chromeless phase lithography (CPL) technology

Hsu, S., Van Den Broeke, D.J., Shi, X., Chen, J.F., Knose, W.T., Corcoran, N.P., Vedula, S., MacNaughton, C.W., Richie, …

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Effect of off-axis illumination on the printability of opaque and transparent reticle defects

J.N. Wiley, L. Karklin

Society of Photo-optical Instrumentation Engineers
12 Conference Proceedings Comprehensive simulation study of the photomask defects printability

Karklin,L.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12