180-nm mask fabrication process using ZEP 7000,multipass gray,GHOST,and dry etch for MEBES 5000
- Author(s):
- Lu,M. ( Etec Systems,Inc. )
- Coleman,T.P.
- Sauer,C.A.
- Publication title:
- 18th Annual BACUS Symposium on Photomask Technology and Management
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3546
- Pub. Year:
- 1998
- Page(from):
- 98
- Page(to):
- 110
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819430076 [0819430072]
- Language:
- English
- Call no.:
- P63600/3546
- Type:
- Conference Proceedings
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