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Structure of polycrystalline silicon films by glow-discharge decomposition using SiH4/H2/SiF4 at low temperature

Author(s):
Publication title:
Nanophase and nanocomposite materials III : symposium held November 29-December 2, 1999, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
581
Pub. Year:
2000
Page(from):
199
Pub. info.:
Pittsburgh, Pa.: MRS-Materials Research Society
ISSN:
02729172
ISBN:
9781558994898 [1558994890]
Language:
English
Call no.:
M23500/581
Type:
Conference Proceedings

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