High density plasma etching of Ta2O5-selectivity to Si and effect of UV light enhancememt

High density plasma etching of Ta2O5-selectivity to Si and effect of UV light enhancememt

Author(s):

Lee, K. P.

Publication title:

Chemical processing of dielectrics, insulators and electronic ceramics : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

606

Pub. Year:

2000

Page(from):

257

Pub. info.:

Warrendale: MRS-Materials Research Society

ISSN:

02729172

ISBN:

9781558995147 [1558995145]

Language:

English

Call no.:

M23500/606

Type:

Conference Proceedings

Details

TDL ID:	ZA00019896
Series ID:	PA00000011
Conf. info. (Name):	Chemical Processing of Dielectrics, Insulators and Electronic Ceramics : Symposium
Conf. info. (Number):	1999
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1999.11.29-1999.12.01

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