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Thermal Studies on Stress-Induced Void-Like Defects in Epitaxial-CoSi2 Formation

Author(s):
Ho, C. S.
Pey, K. L.
Tung, C. H.
Tee, K. C.
Prasad, K.
Saigal, D.
Tan, J. J. L.
Wong, H.
Lee, K. H.
Osipowicz, T.
Chua, S. J.
Karunasiri, R. P. G.
7 more
Publication title:
Advanced interconnects and contacts : symposium held April 5-7, 1999, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
564
Pub. Year:
1999
Page(from):
109
Pub. info.:
Warrendale, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994713 [1558994718]
Language:
English
Call no.:
M23500/564
Type:
Conference Proceedings

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