Disorder and Strain Effects in the Optical Response of Thin CoSi Epitaxial Films on Si(111)

Disorder and Strain Effects in the Optical Response of Thin CoSi Epitaxial Films on Si(111)

Author(s):

Bocelli, S.

Publication title:

Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

402

Pub. Year:

1996

Page(from):

631

Pub. info.:

Pittsburgh: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993051 [1558993053]

Language:

English

Call no.:

M23500/402

Type:

Conference Proceedings

Details

TDL ID:	ZA00019834
Series ID:	PA00000011
Conf. info. (Name):	Symposium on silicide thin films
Conf. info. (Number):	1995
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1995.11.27-1995.11.30

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