Iridium Silicides Formation on High Doses of Ge+ Implanted Si Layers
- Author(s):
Curello, G. Gwilliam, R. Harry, M. Wilson, R. J. Sealy, B. J. Rodriguez, T. Jimenez-Leube, J. - Publication title:
- Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 402
- Pub. Year:
- 1996
- Page(from):
- 411
- Pub. info.:
- Pittsburgh: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558993051 [1558993053]
- Language:
- English
- Call no.:
- M23500/402
- Type:
- Conference Proceedings
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