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Manufacturability Issues for Application of Silicides in 0.25 ヲフm CMOS Process and Beyond

Author(s):
Wang, Q. F.
Lauwers, A.
Jonckx, F.
Potter, M. de
Chen, Chun-Cho
Maex, K.
1 more
Publication title:
Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
402
Pub. date:
1996
Page(from):
221
Pub. info.:
Pittsburgh: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993051 [1558993053]
Language:
English
Call no.:
M23500/402
Type:
Conference Proceedings

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