Manufacturability Issues for Application of Silicides in 0.25 ヲフm CMOS Process and Beyond
- Author(s):
Wang, Q. F. Lauwers, A. Jonckx, F. Potter, M. de Chen, Chun-Cho Maex, K. - Publication title:
- Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 402
- Pub. Year:
- 1996
- Page(from):
- 221
- Pub. info.:
- Pittsburgh: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558993051 [1558993053]
- Language:
- English
- Call no.:
- M23500/402
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Characterization and optimization of CD control for 0.25-ヲフm CMOS applications
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
3
Conference Proceedings
Improved figure-of-merit metric for CMOS transistor performance and its application to 0.25-ヲフm CMOS Technologies
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Characterization of gate electrode etch process for 0.25 ヲフm extended to 0.18 ヲフm
SPIE - The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
12
Conference Proceedings
0.25-ヲフm logic manufacturability using practical 2D optical proximity correction
SPIE-The International Society for Optical Engineering |