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Reduction of the C54-TiSi2 Phase Formation Temperature Using Metallic Impurities

Author(s):
Mann, R. W.
Clevenger, L. A.
Miles, G. L.
Harper, J. M. E.
Cabral, C., Jr
d'Heurle, F. M.
Knotts, T. A.
Rakowski, D. W.
3 more
Publication title:
Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
402
Pub. Year:
1996
Page(from):
95
Pub. info.:
Pittsburgh: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993051 [1558993053]
Language:
English
Call no.:
M23500/402
Type:
Conference Proceedings

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