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PRODUCING AND CONTROLLING SUBSTRATE TEMPERATURE UNIFORMITY FROM 600。?TO 1100。?IN CVD ROTATING DISK REACTORS

Author(s):
Gurary, A. I.
Tompa, G. S.
Stall, R. A.
Kroll, W. J.
Zawadzki, P.
Schumaker, N. E.
1 more
Publication title:
Chemical vapor deposition of refractory metals and ceramics III : symposium held November 28-30, 1994, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
363
Pub. date:
1995
Page(from):
101
Pub. info.:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992641 [1558992642]
Language:
English
Call no.:
M23500/363
Type:
Conference Proceedings

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