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Achieving sub-half-micron i-line manufacturability through automated OPC

Author(s):
Garza,M. ( LSI Logic )
Jackson,E.
Shen,W.P.
Eib,N.K.
Sabouri,S.
Hollerbach,U.
Felmlee,T.L.
Raghavan,V.N.V.
Wang,K.C.
Barouch,E.
Orszag,S.A.
Chao,K.K.
Jensen,J.
8 more
Publication title:
Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3048
Pub. Year:
1997
Page(from):
382
Page(to):
395
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424624 [0819424625]
Language:
English
Call no.:
P63600/3048
Type:
Conference Proceedings

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