Simulation of x-ray mask defect printability
- Author(s):
Bollepalli,B.S. ( Univ.of Wisconsin/Madison ) Hector,S.D. Maldonado,J.R. Leavey,J.A. Cerrina,F. Khan,M. - Publication title:
- Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3048
- Pub. Year:
- 1997
- Page(from):
- 155
- Page(to):
- 166
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819424624 [0819424625]
- Language:
- English
- Call no.:
- P63600/3048
- Type:
- Conference Proceedings
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Comparison of at-wavelength inspection,printability,and simulation of nanometer-scale substrate defects in extreme ultraviolet lithography(EUVL)
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