Three-dimensional electron-beam lithography simulation

Three-dimensional electron-beam lithography simulation

Author(s):: Mack,C.A. ( FINLE Technologies )
Publication title:: Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 3048
Pub. Year:: 1997
Page(from):: 76
Page(to):: 88
Pub. info.:: Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819424624 [0819424625]
Language:: English
Call no.:: P63600/3048
Type:: Conference Proceedings

Details

TDL ID:	ZA00019826
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	1997
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1997.03.10-1997.03.11

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