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Impact of the Coulomb interaction effect on delineating densely repeated 0.1-ｦﾌm patterns using electron-beam block exposure

Author(s):
Takahashi,K. ( Fujitsu Labs.Ltd. )
Yamazaki,S.
Ohno,M.
Watanabe,H.
Sakakibara,T.
Satoh,M.
Nagata,T.
Yamada,A.
Yasuda,H.
Nara,Y.
Sasaki,N.
6 more
Publication title:
Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3048
Pub. Year:
1997
Page(from):
44
Page(to):
53
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424624 [0819424625]
Language:
English
Call no.:
P63600/3048
Type:
Conference Proceedings

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