High-accuracy critical-dimension metrology using a scanning electron microscope
- Author(s):
- Lowney,J.R. ( National Institute of Standards and Technology )
- Vladar,A.E.
- Postek,M.T.
- Publication title:
- Metrology, Inspection, and Process Control for Microlithography X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2725
- Pub. Year:
- 1996
- Page(from):
- 515
- Page(to):
- 526
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421012 [0819421014]
- Language:
- English
- Call no.:
- P63600/2725
- Type:
- Conference Proceedings
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