Using optical pattern filtering defect inspection tools and process-induced defects per wafer pass for process defect control

Using optical pattern filtering defect inspection tools and process-induced defects per wafer pass for process defect control

Author(s):

Publication title:

Metrology, Inspection, and Process Control for Microlithography X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2725

Pub. Year:

1996

Page(from):

217

Page(to):

232

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819421012 [0819421014]

Language:

English

Call no.:

P63600/2725

Type:

Conference Proceedings

Details

TDL ID:	ZA00019794
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology,Inspection, and Process Control for Microlithography
Conf. info. (Number):	1996 : 10th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1996.03.11-1996.03.13

Similar Items:

1 Conference Proceedings *USING FAST AND SENSITIVE PAITERNED WAFER DEFECT DETECTION TOOLS AND FAST DEFECT DATA ANALYSIS IN YIELD ENHANCEMENT PROGRAMS Satterfield, M.J., Alvis, J. Electrochemical Society	7 Conference Proceedings Application of intentional defect arrays for assessing wafer inspection tool capabilities Warrick, A.L., Engbrecht, A., Jarvis, R.J. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Using laser surface scanning and bare wafer review to diagnose photolithography track developer process-induced defect issues Linda M. Bond, Christine Fischer, Michael J. Satterfield, Dan Sutton, Karen L. Turnquest SPIE - The International Society of Optical Engineering	8 Conference Proceedings Qualification of alternating PSM: defect inspection analysis in comparison to wafer printing results Dettmann, W., Heumann, J.P., Hagner, T., Koehle, R., Rahn, S., Verbeek, M., Zarrabian, M., Weckesser, J., Hennig, M., … SPIE-The International Society for Optical Engineering
3 Conference Proceedings Review and characterization of defects after automatic optical inspection on patterned wafers Bichebois,P., Perret,P., Martin,H.M., Brun,A., Burlet,D. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Use of KLA-Tencor STARlight SL 300 for in-process contamination inspection to control reticle defect densities Dutton,D., Shen,W.P., Yee,R., Reynolds,J.A. SPIE - The International Society for Optical Engineering
4 Conference Proceedings Use of intentional-defect wafers for tool inspection validation Jarvis,R.W., Chua,C. SPIE - The International Society for Optical Engineering	10 Conference Proceedings Use of KLA-Tencor STARlight SL 300 for in-process contamination inspection to control reticle defect densities Dutton,D., Shen,W.P., Yee,R., Reynolds,J.A. SPIE - The International Society for Optical Engineering
5 Conference Proceedings Image processing using acousto-optical tunable filtering Denes,L.J., Kaminsky,B., Gottlieb,M.S., Metes,P., Simizu,S., Obermyer,R.T., Thong,C.J., Uschak,M.J., Sankar,S.G. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Semiconductor wafer defect detection using digital holography Schulze, M.A., Hunt, M.A., Voelkl, E., Hickson, J.D., Usry, W.R., Smith, R.G., Bryant, R., Thomas, C.E., Jr. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Product and tool control using integrated auto-macro defect inspection in the photolithography cluster [6152-65] Menon, V. C., Isaacson, R. L., Nicholls, M. C., Lickteig, S. J., Forstner, T., Barnett, A. R., Mulhall, J. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Nondestructive inspection of crystal defects in LiNbO3 wafers by using an optical technique Yamada,M., Matsumura,M., Fukuzawa,M., Higuma,K., Nagata,H. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12