Image paradigm for semiconductor defect data reduction

Image paradigm for semiconductor defect data reduction

Author(s):

Publication title:

Metrology, Inspection, and Process Control for Microlithography X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2725

Pub. Year:

1996

Page(from):

194

Page(to):

205

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819421012 [0819421014]

Language:

English

Call no.:

P63600/2725

Type:

Conference Proceedings

Details

TDL ID:	ZA00019794
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology,Inspection, and Process Control for Microlithography
Conf. info. (Number):	1996 : 10th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1996.03.11-1996.03.13

Similar Items:

1 Conference Proceedings Fuzzy logic connectivity in semiconductor defect clustering Karnowski,T.P., Gleason,S.S., Tobin,K.W.,Jr. SPIE-The International Society for Optical Engineering	7 Technical Paper Fuzzy Logic Connectivity in Semiconductor Defect Clustering Karnowski, T.P., Gleason, S.S., Tobin, K.W., Jr. Society of Manufacturing Engineers
2 Conference Proceedings Detection of semiconductor defects using a novel fractal encoding algorithm Gleason, S.S., Ferrell, R.K., Karnowski, T.P., Tobin, K.W., Jr. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Automatic classification of spatial signatures on semiconductor wafer maps Tobin,K.W., Gleason,S.S., Karnowski,T.P., Cohen,S.L., Lakhani,F. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Feature analysis and classification of manufacturing signatures based on semiconductor wafer maps Tobin,K.W., Gleason,S.S., Karnowski,T.P., Cohen,S.L. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Automatic defect classification: status and industry trends M.H. Bennett, K.W. Tobin, S.S. Gleason Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Rapid yield learning through optical defect and electrical test analysis Gleason,S.S., Tobin,K.W., Karnowski,T.P., Lakhani,F. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Adaptation of the fuzzy k-nearest neighbor classifier for manufacturing automation Tobin,K.W.,Jr., Gleason,S.S., Karnowski,T.P. SPIE-The International Society for Optical Engineering
5 Conference Proceedings An Integrated Spatial Signature Analysis and Automatic Defect Classification System Gleason,S.S., Tobin,K.W., Karnowski,T.P. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Survey of semiconductor data management systems technology Tobin,K.W., Karnowski,T.P., Lakhani,F. SPIE - The International Society for Optical Engineering
6 Conference Proceedings An Integrated Spatial Signature Analysis and Automatic Defect Classification System Gleason, S.S., Tobin, K.W., Karnowski, T.P. Electrochemical Society	12 Conference Proceedings Sidewall structure estimation from CD-SEM for lithographic process control Bingham, P.R., Price, J.R., Tobin, K.W., Jr., Karnowski, T.P., Bennett, M.H., Bogardus, E.H., Bishop, M. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12