Blank Cover Image

Prediction of 0.18-ｦﾌm CMOS technology performance using tuned device simulation

Author(s):
Publication title:
Microelectronic Device and Multilevel Interconnection Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2636
Pub. Year:
1995
Page(from):
100
Page(to):
107
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819420022 [0819420026]
Language:
English
Call no.:
P63600/2636
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Prediction of CMOS transistor performance at 0.10-ｦﾌm gate length using tuned simulations

Sridhar,S., Mehrotra,M., Rodder,M., Nandakumar,M., Chen,I.-C.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Evaluation of Mo-doped Ti salicide process for sub-0.18-ｦﾌm CMOS

Chao,C.-P., Kittl,J.A., Hong,Q.-Z., Shiau,W.-T., Rodder,M., Chen,I.-C.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Tuned MEDICI simulator including inverse short channel effect for sub-0.18-ｦﾌm CMOS technologies

Nandakumar,M., Sridhar,S., Vasanth,K., Hu,J.C., Shiau,W.-T., Mei,P., Rodder,M., Chen,I.-C.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings A Novel Low Temperature Self-Aligned Ti Silicide Technology for Sub-0.18ｦﾌm CMOS Devices

Ren, L. P., Liu, P., Pan, G. Z., Woo, Jason C. S.

MRS - Materials Research Society
3 Conference Proceedings New methodology of simulating pocket-implanted sub-0.18-ｦﾌm CMOS

Mehrotra,M., Hu,J.C., Nandakumar,M., Chattenee,A., Rodder,M., Chen,I.-C.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings A Novel Low-Temperature Self-Aligned Ti Silicide Technology for Sub-0.18 ｦﾌm CMOS Devices

Ren, L. P., Liu, P., Pan, G. Z., Woo, Jason C. S.

MRS - Materials Research Society
4 Conference Proceedings Applicability of RTCVD and LPCVD nitride spacers for sub-0.18-ｦﾌm CMOS technologies

Shiau,W.-T., Hu,J.C., Rodder,M., Tiner,P., Chen,I.-C.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Mask technology for 0.18-ｦﾌm device generation

Sohn,J.M., Choi,S.W., Kim,B.G., Cho,H.K., Yoon,H.S.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Optimum junction depth design of the S/D extension regions (MDD) for sub-0.18-ｦﾌm CMOS technologies

Chao,C.-P., Mehrotra,M., Chen,I.-C.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Process control and optimization of conventional metal process for 0.18-ｦﾌm logic technology

Subramanian,R., Brown,S.E., Chen,S.H., Morales,C., Gallardo,E., Singh,B.

SPIE - The International Society for Optical Engineering
6 Conference Proceedings Shallow source/drain extension formation using antimony and indium pre-amorphization schemes for 0.18- to 0.13-ｦﾌm CMOS technologies

Hu,J.C., Rodder,M., Chen,I.-C.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings 0.18-ｦﾌm gate length CMOS devices with N + polycide gate for 2.5-V application

Choi,J.Y., Zhang,E., Han,C.-C.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12