15-ps cryogenic operation of 0.19-ｦﾌm-LG n+ - p+ double-gate SOI CMOS | 東京工業大学附属図書館文献データベース

15-ps cryogenic operation of 0.19-ｦﾌm-LG n+ - p+ double-gate SOI CMOS

Author(s):

Sugii,T. ( Fujitsu Labs.Ltd. )
Tanaka,T.
Horie,H.
Suzuki,K.

Publication title:

Microelectronic Device and Multilevel Interconnection Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2636

Pub. date:

1995

Page(from):

74

Page(to):

82

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819420022 [0819420026]

Language:

English

Call no.:

P63600/2636

Type:

Conference Proceedings

Details

TDL ID:	ZA00019786
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Microelectronic Manufacturing : Microelectronic Device and Multilevel Interconnection Technology
Conf. info. (Number):	1995
Conf. info. (Venue):	Austin, TX, USA
Conf. info. (Date):	1995.10.25-1995.10.26

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