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Plasma charging effects on device degradation from via sputter etch

Author(s):
Vishnubhotla,L. ( SGS-Thomson Microelectronics,Inc. )
Ling,J.
Huang,J.
Wu,Y.
Smith,G.
Zamanian,M.
Liou,F.-T.
Ashtiani,K.A.
Nicholas,M.D.Mc
4 more
Publication title:
Microelectronic Device and Multilevel Interconnection Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2636
Pub. Year:
1995
Page(from):
44
Page(to):
51
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819420022 [0819420026]
Language:
English
Call no.:
P63600/2636
Type:
Conference Proceedings

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