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Stability of the gate-dielectric/a-Si: H interface with hydrogen plasma treatment

Author(s):
  • Lu,I.-M. ( Industrial Technology Research Institute (Taiwan) )
  • Chen,Y.-E. ( Industrial Technology Research Institute (Taiwan) )
  • Huang,T.-H. ( Industrial Technology Research Institute (Taiwan) )
  • Lin,H.-C. ( Industrial Technology Research Institute (Taiwan) )
Publication title:
Display technologies II : 9-11 July 1998, Taipei, Taiwan
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3421
Pub. Year:
1998
Page(from):
163
Page(to):
167
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819428752 [0819428752]
Language:
English
Call no.:
P63600/3421
Type:
Conference Proceedings

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