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Interdiffusion and stress evolution during solid-state amorphization in Ni-Hf thin-film diffusion couples

Author(s):
  • Atzmon, M. ( Department of Nuclear Engineering and Radiological Sciences, Department of Materials Science and Engineering, The University of Michigan )
  • Boyer, W.S.L. ( Department of Nuclear Engineering and Radiological Sciences, The University of Michigan )
Publication title:
Metastable phases and microstructures : symposium held November 27-30, 1995, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
400
Pub. Year:
1996
Page(from):
143
Page(to):
148
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558993037 [1558993037]
Language:
English
Call no.:
M23500/400
Type:
Conference Proceedings

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