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Dopant Diffusion and Point Defects ni Silicon During Silicidation

Author(s):
Publication title:
Crucial issues in semiconductor materials and processing technologies
Title of ser.:
NATO ASI series. Series E, Applied sciences
Ser. no.:
222
Pub. Year:
1992
Page(from):
415
Page(to):
419
Pages:
5
Pub. info.:
Dordrecht: Kluwer Academic Publishers
ISSN:
0168132X
ISBN:
9780792320036 [0792320034]
Language:
English
Call no.:
N11482/222
Type:
Conference Proceedings

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