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Characteristics of residual products in HF gas-phase etching of sacrificial oxides for silicon micromachining

Author(s):
Publication title:
Design, test, and microfabrication of MEMS and MOEMS : 30 March-1 April 1999, Paris, France
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3680
Pub. Year:
1999
Vol.:
Part2
Page(from):
956
Page(to):
963
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819431547 [0819431540]
Language:
English
Call no.:
P63600/3680
Type:
Conference Proceedings

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