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Mask technology for EUV lithography

Author(s):
Bujak,M. ( Lawrence Livermore National Lab. )
Burkhart,S.C.
Cerjan,C.J.
Kearney,P.A.
Moore,C.E.
Prisbrey,S.
Sweeney,D.W.
Tong,W.M.
Vernon,S.P.
Walton,C.C.
Warrick,A.L.
Weber,F.J.
Wedowski,M.
Wilhelmsen,K.C.
Jeong,S.
Cardinale,G.F.
Ray-Chaudhuri,A.K.
Stivers,A.R.
Tenjil,E.
14 more
Publication title:
15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3665
Pub. Year:
1999
Page(from):
30
Page(to):
39
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819431394 [0819431397]
Language:
English
Call no.:
P63600/3665
Type:
Conference Proceedings

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