Manufacturability of 248-nm phase-shift lithography for 100-nm transistors

Manufacturability of 248-nm phase-shift lithography for 100-nm transistors

Author(s):

Mason,M.E. ( Texas Instruments Inc. )
Randall,J.N.
Kim,K.

Publication title:

Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4000

Pub. Year:

2000

Vol.:

Part2

Page(from):

1347

Page(to):

1359

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436184 [0819436186]

Language:

English

Call no.:

P63600/4000

Type:

Conference Proceedings

Details

TDL ID:	ZA00019438
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2000 : 13th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2000.03.01-2000.03.03

Similar Items:

1 Conference Proceedings Process capability analysis of DUV alternating PSM and DUV attenuated PSM lithography for 100-nm gate fabrication Kim,K., Mason,M.E., Randall,J.N., Kim,W.D. SPIE - The International Society for Optical Engineering	7 Conference Proceedings Feasibility study on the ArF attenuated phase-shift mask for 100-nm node lithography Koo,S.-S., Kim,S.-J., Paek,S.-W., Ahn,C.-N., Ham,Y.-M., Shin,K.-S. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography Fritze,M., Tyrrell,B., Astolfi,D.K., Davis,P., Wheeler,B., Mallen,R., Jarmolowicz,J., Cann,S.G., Chan,D.Y., Rhyins,P.D., … SPIE-The International Society for Optical Engineering	8 Conference Proceedings 248-nm DUV MoSiON embedded phase-shifting mask for 0.25-µm lithography G.T. Dao, G. Liu, R.F. Hainsey, J.N. Farnsworth, Y. Tokoro Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Mask error factor impact on the 130-nm node Randall,J.N., Baum,C.C., Kim,K., Mason,M.E. SPIE - The International Society for Optical Engineering	9 Conference Proceedings Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography Petersen,J.S., Socha,R.J., Naderi,A.R., Baker,C.A., Rizvi,S.A., BanDenBroeke,D., Kachwala,N., Chen,F., Laiding,S., … SPIE-The International Society for Optical Engineering
4 Conference Proceedings New approach to phase metrology for manufacturing 248-nm lithography-based embedded attenuated phase-shifting mask Dao,G.T., Liu,G., Snyder,A., Farnsworth,J.N. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Dual-mask model-based proximity correction for high-performance 0.10-μm CMOS process Palmer,S.R., Mason,M.E., Randall,J.N., Aton,T., Kim,K., Tritchkov,A.V., Burdorf,J., Rieger,M.L., Stirniman,J.P. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography Koo,S.-S., Kim,H.-B., Yune,H.-S., Hong,J.-S., Paek,S.-W., Eom,T.-S., Ahn,C.-N., Ham,Y.-M., Baik,K.-H., Lee,K.-Y., … SPIE-The International Society for Optical Engineering	11 Conference Proceedings 100-nm gate lithography for double-gate transistors Krasnoperova,A.A., Zhang,Y., Babich,I.V., Treichler,J., Yoon,J.H., Guarini,K., Solomon,P.M. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Application of chromeless phase-shift masks to sub-100-nm SOI CMOS transistor fabrication Fritze,M., Burns,J.M., Wyatt,P.W., Astolfi,D.K., Forte,T., Yost,D., Davis,P., Curtis,A.V., Preble,D.M., Cann,S.G., … SPIE - The International Society for Optical Engineering	12 Conference Proceedings Sub-100-nm DRAM cell patterning results and relation with lens aberration at 248-nm lithography era You, T.-J., Kim, H.S., Kim, J.-S., Kim, S.-K., Kim, Y.-D., Youn, H.S., Kong, K.-K. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12