Blank Cover Image

Understanding the parameters for strong phase-shift mask lithography

Author(s):
Publication title:
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4000
Pub. Year:
2000
Vol.:
Part2
Page(from):
1336
Page(to):
1346
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436184 [0819436186]
Language:
English
Call no.:
P63600/4000
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Alternating PSM optimization using model-based OPC

Tritchkov,A., Stirniman,J.P., Rieger,M.L.

SPIE - The International Society for Optical Engineering
7 Conference Proceedings Optimizing proximity correction for wafer fabrication processes

J.P. Stirniman, M.L. Rieger

Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings Optical proximity effects correction at 0.25ｦﾌm incorporating process variations in lithography

Tritchkov,A., Rieger,M.L., Stirniman,J.P., Yen,A., Ronse,K., Vandenberghe,G., hove,L.Van den

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Quantifying proximity and related effects in advanced wafer processes

J.P. Stirniman, M.L. Rieger, R. Gleason

Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Mask fabrication rules for proximity-corrected patterns

Rieger,M.L., Stirniman,J.P.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Customizing proximity correction for process-specific objectives

Rieger,M.L., Stirniman,J.P.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Dual-mask model-based proximity correction for high-performance 0.10-μm CMOS process

Palmer,S.R., Mason,M.E., Randall,J.N., Aton,T., Kim,K., Tritchkov,A.V., Burdorf,J., Rieger,M.L., Stirniman,J.P.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Spatial-filter models to describe IC lithographic behavior

Stirniman,J.P., Rieger,M.L.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings OPC strategies to minimize mask cost and writing time

Rieger,M.L., Mayhew,J.P., Li,J., Shiely,J.P.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Verifying RET mask layouts

Mayhew, J.P., Rieger, M.L., Li, J.W., Zhang, L., Tang, Z.W., Shiely, J.P.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Programmable RET mask layout verification

Beale, D.F., Mayhew, J.P,, Rieger, M.L., Tang, Z.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Anticipating and controlling mask costs within EDA physical design (Invited Paper)

Rieger, M.L., Mayhew, J.P., Melvin, L.S., Lugg, R.M., Beale, D.F.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12