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Application of attenuated phase-shift masks to sub-0.18-ｦﾌm logic patterns

Author(s):
Fritze,M. ( MIT Lincoln Lab. )
Wyatt,P.W.
Astolfi,D.K.
Davis,P.
Curtis,A.V.
Preble,D.M.
Cann,S.G.
Denault,S.
Chan,D.
Shaw,J.C.
Sullivan,N.T.
Brandom,R.
Mastovich,M.E.
8 more
Publication title:
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4000
Pub. Year:
2000
Vol.:
Part2
Page(from):
1179
Page(to):
1192
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436184 [0819436186]
Language:
English
Call no.:
P63600/4000
Type:
Conference Proceedings

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