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Forbidden pitches for 130-nm lithography and below

Author(s):
Socha,R.J. ( ASML MaskTools )
Dusa,M.V.
Capodieci,L.
Finders,J.
Chen,J.F.
Flagello,D.G.
Cummings,K.D.
2 more
Publication title:
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4000
Pub. date:
2000
Vol.:
Part2
Page(from):
1140
Page(to):
1155
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436184 [0819436186]
Language:
English
Call no.:
P63600/4000
Type:
Conference Proceedings

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